- 专利标题: EUV radiation modification methods and systems
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申请号: US17248785申请日: 2021-02-08
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公开(公告)号: US11419203B2公开(公告)日: 2022-08-16
- 发明人: Chun-Lin Louis Chang , Jen-Hao Yeh , Tzung-Chi Fu , Bo-Tsun Liu , Li-Jui Chen , Po-Chung Cheng
- 申请人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Haynes and Boone, LLP
- 主分类号: H05G2/00
- IPC分类号: H05G2/00 ; G03F7/00 ; G03F7/20
摘要:
A method and system for generating EUV light includes providing a laser beam having a Gaussian distribution. This laser beam can be then modified from a Gaussian distribution to a ring-like distribution. The modified laser beam is provided through an aperture in a collector and interfaces with a moving droplet target, which generates an extreme ultraviolet (EUV) wavelength light. The generated EUV wavelength light is provided to the collector away from the aperture. In some embodiments, a mask element may also be used to modify the laser beam to a shape.
公开/授权文献
- US20210168923A1 EUV RADIATION MODIFICATION METHODS AND SYSTEMS 公开/授权日:2021-06-03
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