Invention Grant
- Patent Title: Methods and apparatus for high reflectivity aluminum layers
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Application No.: US16398782Application Date: 2019-04-30
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Publication No.: US11421318B2Publication Date: 2022-08-23
- Inventor: Jacqueline Wrench , Liqi Wu , Hsiang Ning Wu , Paul Ma , Sang-Ho Yu , Fuqun Grace Vasiknanonte , Nobuyuki Sasaki
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Main IPC: C23C16/12
- IPC: C23C16/12 ; H01L21/02

Abstract:
Methods and apparatus for increasing reflectivity of an aluminum layer on a substrate. In some embodiments, a method of depositing an aluminum layer on a substrate comprises depositing a layer of cobalt or cobalt alloy or a layer of titanium or titanium alloy on the substrate with a chemical vapor deposition (CVD) process, pre-treating the layer of cobalt or cobalt alloy with a thermal hydrogen anneal at a temperature of approximately 400 degrees Celsius if a top surface of the layer of cobalt or cobalt alloy is compromised, and depositing a layer of aluminum on the layer of cobalt or cobalt alloy or the layer of titanium or titanium alloy with a CVD process at a temperature of approximately 120 degrees Celsius. Pre-treatment of the layer of cobalt or cobalt alloy may be accomplished for a duration of approximately 60 seconds to approximately 120 seconds.
Public/Granted literature
- US20190338415A1 METHODS AND APPARATUS FOR HIGH REFLECTIVITY ALUMINUM LAYERS Public/Granted day:2019-11-07
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