Invention Grant
- Patent Title: Patterning process improvement involving optical aberration
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Application No.: US16769534Application Date: 2018-12-17
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Publication No.: US11422472B2Publication Date: 2022-08-23
- Inventor: Paulus Jacobus Maria Van Adrichem , Ahmad Wasiem Ibrahim El-Said , Christoph Rene Konrad Cebulla Hennerkes , Johannes Christiaan Maria Jasper
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2018/085166 WO 20181217
- International Announcement: WO2019/121491 WO 20190627
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A method involving: obtaining a process model of a patterning process that includes or accounts for an average optical aberration of optical systems of a plurality of apparatuses for use with a patterning process; and applying the process model to determine an adjustment to a parameter of the patterning process to account for the average optical aberration.
Public/Granted literature
- US20210165332A1 PATTERNING PROCESS IMPROVEMENT INVOLVING OPTICAL ABERRATION Public/Granted day:2021-06-03
Information query
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