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公开(公告)号：US11422472B2
公开(公告)日：2022-08-23
申请号：US16769534
申请日：2018-12-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Paulus Jacobus Maria Van Adrichem , Ahmad Wasiem Ibrahim El-Said , Christoph Rene Konrad Cebulla Hennerkes , Johannes Christiaan Maria Jasper
IPC: G03F7/20
Abstract: A method involving: obtaining a process model of a patterning process that includes or accounts for an average optical aberration of optical systems of a plurality of apparatuses for use with a patterning process; and applying the process model to determine an adjustment to a parameter of the patterning process to account for the average optical aberration.
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公开(公告)号：US09904180B2
公开(公告)日：2018-02-27
申请号：US14825771
申请日：2015-08-13
Applicant: ASML Netherlands B.V.
IPC: G03F7/20
CPC classification number: G03F7/705 , G03F7/70058 , G03F7/70141 , G03F7/706 , G03F7/70891
Abstract: A method of patterning substrates using a lithographic apparatus. The method comprising providing a beam of radiation using an illumination system, using a patterning device to impart the radiation beam with a pattern in its cross-section, and using a projection system to project the patterned radiation beam onto target portions of a lot of substrates, wherein the method further comprises performing a radiation beam aberration measurement after projecting the patterned radiation beam onto a subset of the lot of substrates, performing an adjustment of the projection system using the results of the radiation beam aberration measurement, then projecting the patterned radiation beam onto a further subset of the lot of substrates.
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公开(公告)号：US09791787B2
公开(公告)日：2017-10-17
申请号：US14934623
申请日：2015-11-06
Applicant: ASML Netherlands B.V.
IPC: G03F7/20
CPC classification number: G03F7/705 , G03F7/70058 , G03F7/70141 , G03F7/706 , G03F7/70891
Abstract: A method of patterning substrates using a lithographic apparatus. The method comprising providing a beam of radiation using an illumination system, using a patterning device to impart the radiation beam with a pattern in its cross-section, and using a projection system to project the patterned radiation beam onto target portions of a lot of substrates, wherein the method further comprises performing a radiation beam aberration measurement after projecting the patterned radiation beam onto a subset of the lot of substrates, performing an adjustment of the projection system using the results of the radiation beam aberration measurement, then projecting the patterned radiation beam onto a further subset of the lot of substrates.
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公开(公告)号：US09606448B2
公开(公告)日：2017-03-28
申请号：US13903885
申请日：2013-05-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Erik Roelof Loopstra , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Matthew Lipson , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Tammo Uitterdijk
CPC classification number: G03F7/70866 , G03F7/7015 , G03F7/70341 , Y10S430/162
Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
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公开(公告)号：US10146142B2
公开(公告)日：2018-12-04
申请号：US15419769
申请日：2017-01-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Erik Roelof Loopstra , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Matthew Lipson , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Tammo Uitterdijk
Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
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Patent Agency Ranking
公开(公告)号：US09304411B2
公开(公告)日：2016-04-05
申请号：US13767774
申请日：2013-02-14
Applicant: ASML Netherlands B.V.
IPC: G03F7/20
CPC classification number: G03F7/705 , G03F7/70058 , G03F7/70141 , G03F7/706 , G03F7/70891
Abstract: A method of patterning substrates using a lithographic apparatus. The method comprising providing a beam of radiation using an illumination system, using a patterning device to impart the radiation beam with a pattern in its cross-section, and using a projection system to project the patterned radiation beam onto target portions of a lot of substrates, wherein the method further comprises performing a radiation beam aberration measurement after projecting the patterned radiation beam onto a subset of the lot of substrates, performing an adjustment of the projection system using the results of the radiation beam aberration measurement, then projecting the patterned radiation beam onto a further subset of the lot of substrates.
Abstract translation: 使用光刻设备对衬底进行图案化的方法。 该方法包括使用照明系统提供辐射束，使用图案形成装置将辐射束赋予其横截面中的图案，以及使用投影系统将图案化的辐射束投影到许多基底的目标部分上 其中所述方法还包括在将所述图案化的辐射束投影到所述许多衬底的子集之后执行辐射束像差测量，使用所述辐射束像差测量的结果执行所述投影系统的调整，然后将所述图案化的辐射束 进入许多底物的另一个子集。
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公开(公告)号：US20190086819A1
公开(公告)日：2019-03-21
申请号：US16197416
申请日：2018-11-21
Applicant: ASML NETHERLANDS B.V
Inventor： Erik Roelof LOOPSTRA , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Matthew Lipson , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Tammo Uitterdijk
IPC: G03F7/20
Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
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公开(公告)号：US09442388B2
公开(公告)日：2016-09-13
申请号：US14456845
申请日：2014-08-11
Applicant: ASML NETHERLANDS B.V.
Inventor： Erik Roelof Loopstra , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Matthew Lipson , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Tammo Uitterdijk
CPC classification number: G03F7/70866 , G03F7/7015 , G03F7/70341 , Y10S430/162
Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate, Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
Abstract translation: 公开了一种用于位于投影系统和基板之间的浸液的光刻投影装置。公开了几种方法和机构来保护投影系统，基板台和液体限制系统的部件。 这些包括在投影系统的最终元件上提供保护涂层，以及在部件上游提供一个或多个牺牲体。 还公开了CaF2的双组分最终光学元件。
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公开(公告)号：US20160062243A1
公开(公告)日：2016-03-03
申请号：US14934623
申请日：2015-11-06
Applicant: ASML Netherlands B.V.
IPC: G03F7/20
CPC classification number: G03F7/705 , G03F7/70058 , G03F7/70141 , G03F7/706 , G03F7/70891
Abstract: A method of patterning substrates using a lithographic apparatus. The method comprising providing a beam of radiation using an illumination system, using a patterning device to impart the radiation beam with a pattern in its cross-section, and using a projection system to project the patterned radiation beam onto target portions of a lot of substrates, wherein the method further comprises performing a radiation beam aberration measurement after projecting the patterned radiation beam onto a subset of the lot of substrates, performing an adjustment of the projection system using the results of the radiation beam aberration measurement, then projecting the patterned radiation beam onto a further subset of the lot of substrates.
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公开(公告)号：US20140347642A1
公开(公告)日：2014-11-27
申请号：US14456845
申请日：2014-08-11
Applicant: ASML NETHERLANDS B.V.
Inventor： Erik Roelof LOOPSTRA , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Matthew Lipson , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Tammo Uitterdijk
IPC: G03F7/20
CPC classification number: G03F7/70866 , G03F7/7015 , G03F7/70341 , Y10S430/162
Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate, Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
Abstract translation: 公开了一种用于位于投影系统和基板之间的浸液的光刻投影装置。公开了几种方法和机构来保护投影系统，基板台和液体限制系统的部件。 这些包括在投影系统的最终元件上提供保护涂层，以及在部件上游提供一个或多个牺牲体。 还公开了CaF2的双组分最终光学元件。
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