Invention Grant
- Patent Title: Utilize pattern recognition to improve SEM contour measurement accuracy and stability automatically
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Application No.: US17256332Application Date: 2019-06-21
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Publication No.: US11422473B2Publication Date: 2022-08-23
- Inventor: Jiao Liang , Chen Zhang , Qiang Zhang , Yunbo Guo
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2019/066520 WO 20190621
- International Announcement: WO2020/011513 WO 20200116
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A method for improving a process model by measuring a feature on a printed design that was constructed based in part on a target design is disclosed. The method includes obtaining a) an image of the printed design from an image capture device and b) contours based on shapes in the image. The method also includes identifying, by a pattern recognition program, patterns on the target design that include the feature and determining coordinates, on the contours, that correspond to the feature. The method further includes improving the process model by at least a) providing a measurement of the feature based on the coordinates and b) calibrating the process model based on a comparison of the measurement with a corresponding feature in the target design.
Public/Granted literature
- US20210263426A1 UTILIZE PATTERN RECOGNITION TO IMPROVE SEM CONTOUR MEASUREMENT ACCURACY AND STABILITY AUTOMATICALLY Public/Granted day:2021-08-26
Information query
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