Invention Grant
- Patent Title: Methods and apparatus for monitoring a lithographic manufacturing process
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Application No.: US17061641Application Date: 2020-10-02
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Publication No.: US11422476B2Publication Date: 2022-08-23
- Inventor: Emil Peter Schmitt-Weaver , Kaustuve Bhattacharyya , Wim Tjibbo Tel , Frank Staals , Leon Martin Levasier
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: EP17156769 20170217
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F9/00
Abstract:
A method for monitoring a lithographic process, and associated lithographic apparatus. The method includes obtaining height variation data relating to a substrate supported by a substrate support and fitting a regression through the height variation data, the regression approximating the shape of the substrate; residual data between the height variation data and the regression is determined; and variation of the residual data is monitored over time. The residual data may be deconvolved based on known features of the substrate support.
Public/Granted literature
- US20210018847A1 METHODS & APPARATUS FOR MONITORING A LITHOGRAPHIC MANUFACTURING PROCESS Public/Granted day:2021-01-21
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