公开(公告)号：US10935895B2

公开(公告)日：2021-03-02

申请号：US16539487

申请日：2019-08-13

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Hendrik Koevoets ,  Erik Johan Arlemark ,  Sander Catharina Reinier Derks ,  Sjoerd Nicolaas Lambertus Donders ,  Wilfred Edward Endendijk ,  Franciscus Johannes Joseph Janssen ,  Raymond Wilhelmus Louis Lafarre ,  Leon Martin Levasier ,  Jim Vincent Overkamp ,  Nicolaas Ten Kate ,  Jacobus Cornelis Gerardus Van Der Sanden

IPC: G03B27/52 ,  G03F7/20 ,  H01L21/67 ,  H01L21/683

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

公开(公告)号：US11422476B2

公开(公告)日：2022-08-23

申请号：US17061641

申请日：2020-10-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Emil Peter Schmitt-Weaver ,  Kaustuve Bhattacharyya ,  Wim Tjibbo Tel ,  Frank Staals ,  Leon Martin Levasier

IPC: G03F7/20 ,  G03F9/00

Abstract: A method for monitoring a lithographic process, and associated lithographic apparatus. The method includes obtaining height variation data relating to a substrate supported by a substrate support and fitting a regression through the height variation data, the regression approximating the shape of the substrate; residual data between the height variation data and the regression is determined; and variation of the residual data is monitored over time. The residual data may be deconvolved based on known features of the substrate support.

公开(公告)号：US09983489B2

公开(公告)日：2018-05-29

申请号：US15311548

申请日：2015-04-24

Applicant: ASML Netherlands B.V.

Inventor： Christianus Wilhelmus Johannes Berendsen ,  Marcel Beckers ,  Henricus Jozef Castelijns ,  Hubertus Antonius Geraets ,  Adrianus Hendrik Koevoets ,  Leon Martin Levasier ,  Peter Schaap ,  Bob Streefkerk ,  Siegfried Alexander Tromp

IPC: G03F7/20

CPC classification number: G03F7/70883 ,  G03F7/70033 ,  G03F7/70625 ,  G03F7/70783 ,  G03F7/70875 ,  G03F7/70891 ,  G03F7/70941

Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.