Invention Grant
- Patent Title: Method and apparatus for illumination adjustment
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Application No.: US17081325Application Date: 2020-10-27
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Publication No.: US11429029B2Publication Date: 2022-08-30
- Inventor: Maurits Van Der Schaar , Patrick Warnaar , Youping Zhang , Arie Jeffrey Den Boef , Feng Xiao , Martin Ebert
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F9/00
Abstract:
A method includes projecting an illumination beam of radiation onto a metrology target on a substrate, detecting radiation reflected from the metrology target on the substrate, and determining a characteristic of a feature on the substrate based on the detected radiation, wherein a polarization state of the detected radiation is controllably selected to optimize a quality of the detected radiation.
Public/Granted literature
- US20210055663A1 METHOD AND APPARATUS FOR ILLUMINATION ADJUSTMENT Public/Granted day:2021-02-25
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