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公开(公告)号：US11429029B2
公开(公告)日：2022-08-30
申请号：US17081325
申请日：2020-10-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Maurits Van Der Schaar , Patrick Warnaar , Youping Zhang , Arie Jeffrey Den Boef , Feng Xiao , Martin Ebert
Abstract: A method includes projecting an illumination beam of radiation onto a metrology target on a substrate, detecting radiation reflected from the metrology target on the substrate, and determining a characteristic of a feature on the substrate based on the detected radiation, wherein a polarization state of the detected radiation is controllably selected to optimize a quality of the detected radiation.
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