Invention Grant
- Patent Title: RAMO4 substrate and method of manufacture thereof, and group III nitride semiconductor
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Application No.: US16691542Application Date: 2019-11-21
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Publication No.: US11441237B2Publication Date: 2022-09-13
- Inventor: Naoya Ryoki , Kentaro Miyano , Masaki Nobuoka , Akihiko Ishibashi
- Applicant: Panasonic Intellectual Property Management Co., Ltd.
- Applicant Address: JP Osaka
- Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JPJP2018-230734 20181210
- Main IPC: H01L29/15
- IPC: H01L29/15 ; C30B29/26 ; H01L29/20 ; H01L29/205 ; C30B25/18 ; H01L21/02 ; C30B15/22 ; C30B29/40

Abstract:
A RAMO4 substrate that does not easily crack during or after the formation of group III nitride crystal includes a single crystal represented by general formula RAMO4 (wherein R represents one or more trivalent elements selected from the group consisting of Sc, In, Y, and lanthanoid elements, A represents one or more trivalent elements selected from the group consisting of Fe(III), Ga, and Al, and M represents one or more divalent elements selected from the group consisting of Mg, Mn, Fe(II), Co, Cu, Zn, and Cd). The RAMO4 substrate has a crystal plane with a curvature radius r of 52 m or more, and a square value of correlation coefficient ρ of 0.81 or more. The curvature radius r is calculated as an absolute value from X-ray peak position ωi and measurement position Xi after the measurements of X-ray peak positions ωi at a plurality of positions Xi lying on a straight line passing through the center of the RAMO4 substrate. The correlation coefficient ρ is a measure of correlation between ω and measurement position Xi.
Public/Granted literature
- US20200181801A1 RAMO4 SUBSTRATE AND METHOD OF MANUFACTURE THEREOF, AND GROUP III NITRIDE SEMICONDUCTOR Public/Granted day:2020-06-11
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