Invention Grant
- Patent Title: Method for producing wafers using ultrasound
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Application No.: US16685393Application Date: 2019-11-15
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Publication No.: US11446771B2Publication Date: 2022-09-20
- Inventor: Ryohei Yamamoto
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: DISCO CORPORATION
- Current Assignee: DISCO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain Ltd.
- Priority: JPJP2018-218399 20181121
- Main IPC: H01L29/16
- IPC: H01L29/16 ; B23K26/53 ; B23K26/00 ; B23K26/02 ; B23K103/00 ; B23K101/40

Abstract:
A wafer producing method for producing a wafer from an ingot, the ingot being previously formed with a separation layer along which the wafer is to be separated from the ingot. The wafer producing method includes a first ultrasonic vibration applying step of applying ultrasonic vibration to a given area of the ingot at a high density to thereby form a partially broken portion where a part of the separation layer is broken, a second ultrasonic vibration applying step of applying the ultrasonic vibration to the whole area of the ingot larger than the given area at a low density, after performing the first ultrasonic vibration applying step, thereby forming a fully broken portion where the separation layer is fully broken in such a manner that breaking starts from the partially broken portion, and a separating step of separating the wafer from the ingot along the fully broken portion.
Public/Granted literature
- US20200156190A1 WAFER PRODUCING METHOD Public/Granted day:2020-05-21
Information query
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