Invention Grant
- Patent Title: Gas barrier film, optical element including gas barrier film, and method for producing gas barrier film
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Application No.: US16926941Application Date: 2020-07-13
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Publication No.: US11450835B2Publication Date: 2022-09-20
- Inventor: Eijiro Iwase
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JPJP2018-038781 20180305
- Main IPC: H01L29/08
- IPC: H01L29/08 ; H01L51/52 ; C23C16/34 ; C23C16/50 ; H01L27/32 ; H01L51/00 ; H01L51/56

Abstract:
A gas barrier film includes a substrate, a peeling resin layer from which the substrate can be peeled off, one or more inorganic layers, and an adhesive layer provided on an inorganic layer most spaced from the substrate, in which an inorganic layer is provided on a surface of the peeling resin layer, the peeling resin layer is a resin layer including a phenyl group, and the adhesive layer is solid at normal temperature and has fluidity by heating, thereby exhibiting adhesiveness.
Public/Granted literature
- US20200343484A1 GAS BARRIER FILM, OPTICAL ELEMENT, AND METHOD FOR PRODUCING GAS BARRIER FILM Public/Granted day:2020-10-29
Information query
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