Invention Grant
- Patent Title: Pellicle for reflective mask
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Application No.: US16922328Application Date: 2020-07-07
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Publication No.: US11454882B2Publication Date: 2022-09-27
- Inventor: Jinhwan Lee , Jeonggil Kim , Sunghyup Kim
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2019-0131392 20191022
- Main IPC: G03F1/64
- IPC: G03F1/64 ; G03F1/62
Abstract:
A pellicle for a reflective mask includes a pellicle body, a pellicle frame below the pellicle body to support the pellicle body, and a pattern structure in at least a part of a surface of the pellicle body, wherein the pattern structure includes a plurality of patterns.
Public/Granted literature
- US20210116802A1 PELLICLE FOR REFLECTIVE MASK Public/Granted day:2021-04-22
Information query
