公开(公告)号：US11711883B2

公开(公告)日：2023-07-25

申请号：US17393474

申请日：2021-08-04

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Minseok Choi ,  Injae Lee ,  Inho Choi ,  Sungyeol Kim ,  Sunghyup Kim ,  Jeonggil Kim ,  Jongbin Park

IPC: H05G2/00 ,  G03F7/20 ,  G03F7/00

CPC classification number: H05G2/006 ,  G03F7/70033 ,  G03F7/7055 ,  H05G2/008

Abstract: A droplet accelerating assembly includes an acceleration chamber extending in a first direction parallel to an ejection direction of the droplet, the acceleration chamber having a first side connected to the droplet generator, a second side opposite the first side in the first direction, the second side including a discharge hole, and a fluid flow path, a pressure controller connected to the fluid flow path of the acceleration chamber, the pressure controller being configured to adjust an internal pressure of the acceleration chamber, an electrifier in the acceleration chamber, the electrifier being configured to electrify the droplet ejected by the droplet generator into an electrified droplet, and an accelerator in the acceleration chamber, the accelerator being configured to accelerate the electrified droplet.

公开(公告)号：US20240142886A1

公开(公告)日：2024-05-02

申请号：US18322161

申请日：2023-05-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Injae Lee ,  Sungyong Bae ,  Daegeun Yoon ,  Inho Choi ,  Sunghyup Kim ,  Euishin Kim ,  Jeonggil Kim ,  Yebin Nam ,  Dongjin Lee ,  Jonggu Lee ,  Dohyun Jung ,  Dongsik Jeong

IPC: G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70908 ,  G03F7/70716 ,  H01L21/68

Abstract: A substrate processing apparatus includes a table in an exposure chamber that is configured to perform an exposure process on a semiconductor substrate, a guiding device including a first horizontal driving body slidably movable in a first horizontal direction and a guide rail on the first horizontal driving body and having a trench extending in a second horizontal direction, a positioning device connected to the guiding device, the positioning device including a slider, a second horizontal driving body and a substrate stage, the slider configured to slidably move in the second horizontal direction along the trench, the second horizontal driving body connected or fixed to the slider, the substrate stage on the second horizontal driving body and configured to support the semiconductor substrate, and a blocking member between the guide rail and the substrate stage to block an inflow of foreign substances onto the substrate stage.

公开(公告)号：US11852984B2

公开(公告)日：2023-12-26

申请号：US18164835

申请日：2023-02-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sunghyup Kim ,  Ho Yu ,  Jeonggil Kim ,  Minseok Choi

IPC: G03F7/00 ,  H05G2/00 ,  G21K1/06

CPC classification number: G03F7/70916 ,  G03F7/70033 ,  G03F7/70891 ,  G21K1/06 ,  H05G2/005 ,  H05G2/008

Abstract: A target debris collection device for extreme ultraviolet (EUV) light source apparatus, includes a baffle body extending within an EUV vessel between a collector and an outlet port of the EUV vessel to allow EUV light reflected from the collector to pass through an internal transmissive region thereof, a discharge plate provided in a first end portion of the baffle body adjacent to the collector to collect the target material debris on an inner surface of the baffle body, a guide structure to guide the target material debris collected in the discharge plate to a collection tank, and a first heating member provided in the guide structure to prevent the target material debris from being solidified.

公开(公告)号：US11048179B2

公开(公告)日：2021-06-29

申请号：US16733325

申请日：2020-01-03

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Ho Yu ,  Jinhwan Lee ,  Minseok Choi ,  Jeonggil Kim ,  Jongbin Park ,  Inho Choi

IPC: G03F7/20

Abstract: An apparatus for removing residues from a source vessel in an extreme ultraviolet lithography device, the apparatus including a frame portion, and a heater structure on the frame portion, the heater structure having a head on the frame portion, the head being rotatable in at least one shaft direction, and a heater on the head to dissipate heat toward residues in the source vessel, the heater to apply temperature of 200° C. to 800° C.

公开(公告)号：US11599031B2

公开(公告)日：2023-03-07

申请号：US17555985

申请日：2021-12-20

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sunghyup Kim ,  Ho Yu ,  Jeonggil Kim ,  Minseok Choi

IPC: G03F7/20 ,  H05G2/00 ,  G21K1/06

Abstract: A target debris collection device for extreme ultraviolet (EUV) light source apparatus, includes a baffle body extending within an EUV vessel between a collector and an outlet port of the EUV vessel to allow EUV light reflected from the collector to pass through an internal transmissive region thereof, a discharge plate provided in a first end portion of the baffle body adjacent to the collector to collect the target material debris on an inner surface of the baffle body, a guide structure to guide the target material debris collected in the discharge plate to a collection tank, and a first heating member provided in the guide structure to prevent the target material debris from being solidified.

公开(公告)号：US20240069443A1

公开(公告)日：2024-02-29

申请号：US18144622

申请日：2023-05-08

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Donghyeong Kim ,  Eunhee Jeang ,  Teun Boeren ,  Yoonsang Lee ,  Jeonggil Kim ,  Kyungbin Park

IPC: G03F7/20 ,  G01J1/42

CPC classification number: G03F7/70266 ,  G01J1/4257 ,  G03F7/70308 ,  G03F7/70516 ,  G03F7/706 ,  H01L21/0274

Abstract: An illumination correction apparatus for correcting a radiation beam incident on a reticle from an exposure apparatus includes a plurality of fingers each having a surface facing an incident direction of the radiation beam, the plurality of fingers being arranged in a first direction to be adjacent to a path of the radiation beam, and configured to adjust an amount of the incident radiation beam by moving in a second direction, intersecting the first direction, a controller connected to the plurality of fingers and configured to control movement of the plurality of fingers such that an intensity of the radiation beam has uniformity in the first direction, at least one optical sensor on the surface of at least one finger of the plurality of fingers, and a measurement unit configured to measure, based on an output of the at least one optical sensor, the intensity of the radiation beam.

公开(公告)号：US11822260B2

公开(公告)日：2023-11-21

申请号：US17939293

申请日：2022-09-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jongbin Park ,  Minseok Choi ,  Inho Choi ,  Jeonggil Kim

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70925 ,  G03F7/70033 ,  G03F7/7085 ,  G03F7/70975

Abstract: An apparatus for removing a residue of an EUV light source vessel including an internal side surface having a curved surface is provided. The apparatus includes a frame portion configured to be disposed on a bottom surface of an EUV light source vessel and a head portion above the frame portion. The head portion is configured to be rotatably moved on a circular trajectory while maintaining a desired (and/or alternatively predetermined) distance from the curved surface of the EUV light source vessel. The head portion may have a heating member configured to emit heat toward the curved surface of the EUV light source vessel. The heating member may have a shape curved in an arc corresponding to a portion of the circular trajectory.

公开(公告)号：US11720027B2

公开(公告)日：2023-08-08

申请号：US17409715

申请日：2021-08-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Injae Lee ,  Ohkug Kwon ,  Sunghyup Kim ,  Yongchan Kim ,  Ouiserg Kim ,  Jeonggil Kim ,  Junghwan Kim ,  Hosun Yoo ,  Daerim Choi ,  Dongkyeng Han

IPC: H05G2/00 ,  G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70033 ,  G03F7/70166 ,  G03F7/70858 ,  G03F7/70916

Abstract: An extreme ultraviolet (EUV) light generating apparatus includes a vessel including a first end and a second end opposite to each other and providing an internal space extending from the first end to the second end, a concave mirror adjacent to the first end of the vessel, a droplet generator supplying a droplet to the internal space of the vessel, a laser light source irradiating a laser beam to cause the droplet to emit EUV light, and a gas jet receiving a flow control gas and spraying the received flow control gas into the internal space of the vessel. The gas jet includes a ring-shaped main body including nozzles spaced apart from one another in a circumferential direction. The nozzles spray the received flow control gas in a downward direction.

公开(公告)号：US20220082946A1

公开(公告)日：2022-03-17

申请号：US17409715

申请日：2021-08-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Injae Lee ,  Ohkug Kwon ,  Sunghyup Kim ,  Yongchan Kim ,  Ouiserg Kim ,  Jeonggil Kim ,  Junghwan Kim ,  Hosun Yoo ,  Daerim Choi ,  Dongkyeng Han

IPC: G03F7/20

Abstract: An extreme ultraviolet (EUV) light generating apparatus includes a vessel including a first end and a second end opposite to each other and providing an internal space extending from the first end to the second end, a concave mirror adjacent to the first end of the vessel, a droplet generator supplying a droplet to the internal space of the vessel, a laser light source irradiating a laser beam to cause the droplet to emit EUV light, and a gas jet receiving a flow control gas and spraying the received flow control gas into the internal space of the vessel. The gas jet includes a ring-shaped main body including nozzles spaced apart from one another in a circumferential direction. The nozzles spray the received flow control gas in a downward direction.

公开(公告)号：US20240079264A1

公开(公告)日：2024-03-07

申请号：US18235603

申请日：2023-08-18

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jonggu Lee ,  Jeonggil Kim ,  Hyeonjin Kim ,  Kyoungwhan Oh

IPC: H01L21/687 ,  H01L21/67

CPC classification number: H01L21/68742 ,  H01L21/67288 ,  H01L21/68785

Abstract: A substrate supporting apparatus includes a stage table configured to support a substrate and including a plurality of openings, a plurality of lift pins disposed to be vertically movable through the plurality of openings and configured to support the substrate, a lift support positioned outside the stage table from a plan view and vertically movable to support the substrate, an actuator configured to vertically actuate the plurality of lift pins and the lift support so as to load the substrate onto the stage table, and a controller configured to control the actuator.