Invention Grant
- Patent Title: Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder
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Application No.: US17313054Application Date: 2021-05-06
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Publication No.: US11454895B2Publication Date: 2022-09-27
- Inventor: Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/687 ; C23C16/44
Abstract:
A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
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