Invention Grant
- Patent Title: Measurement method using radio frequency power amplifier
-
Application No.: US17006892Application Date: 2020-08-31
-
Publication No.: US11456711B2Publication Date: 2022-09-27
- Inventor: En-Hsiang Yeh , Wen-Sheng Chen , Chia-Ming Liang , Chung-Ho Chai , Zong-You Li , Tzu-Jin Yeh
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: JCIPRNET
- Main IPC: H03F1/22
- IPC: H03F1/22 ; H03F3/195 ; H03F3/24

Abstract:
The measurement method includes operations of applying a first gate bias voltage to a gate terminal of a first transistor that is included in a radio frequency (RF) power amplifier during a direct current (DC) measurement period, wherein the first transistor operates in a linear operation mode during the DC measurement period; measuring a first drain-source voltage of the first transistor and a current flowing through the first transistor via a connection node during the DC measurement period; applying a second gate bias voltage and a drain bias voltage to a gate terminal and a drain terminal of a second transistor that is electrically connected to the first transistor via the connection node; and measuring a DC value of the second transistor via the connection node during the DC measurement period.
Public/Granted literature
- US20220069779A1 MEASUREMENT METHOD USING RADIO FREQUENCY POWER AMPLIFIER Public/Granted day:2022-03-03
Information query
IPC分类: