- Patent Title: Actinic ray-sensitive or radiation-sensitive composition, method for producing actinic ray-sensitive or radiation-sensitive composition, pattern forming method, and method for manufacturing electronic device
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Application No.: US16109868Application Date: 2018-08-23
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Publication No.: US11460769B2Publication Date: 2022-10-04
- Inventor: Wataru Nihashi , Hideaki Tsubaki
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JPJP2016-060954 20160324
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/16 ; G03F7/20 ; G03F7/32 ; G03F7/38

Abstract:
An actinic ray-sensitive or radiation-sensitive composition, and an actinic ray-sensitive or radiation-sensitive composition obtained by the method for producing an actinic ray-sensitive or radiation-sensitive composition each contain a cation having a metal atom, and a ligand, in which a value of σ represented by Equation (1) is 2.2 or less. A pattern forming method and the method for manufacturing an electronic device each use the actinic ray-sensitive or radiation-sensitive composition. σ = ∑ k = 1 N { ( μ - X k ) 2 × y k } ( 1 )
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