Invention Grant
- Patent Title: Conformal halogen doping in 3D structures using conformal dopant film deposition
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Application No.: US16640580Application Date: 2018-08-28
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Publication No.: US11462630B2Publication Date: 2022-10-04
- Inventor: Rui Cheng , Yi Yang , Karthik Janakiraman , Abhijit Basu Mallick
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- International Application: PCT/US2018/048341 WO 20180828
- International Announcement: WO2019/046301 WO 20190307
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L21/02 ; H01L29/78
Abstract:
Embodiments described herein generally relate to doping of three dimensional (3D) structures on a substrate. In some embodiments, a conformal dopant containing film may be deposited over the 3D structures. Suitable dopants that may be incorporated in the film include halogen atoms. The film may be subsequently annealed to diffuse the dopants into the 3D structures.
Information query
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