Invention Grant
- Patent Title: Method for adjusting the stress state of a piezoelectric film and acoustic wave device employing such a film
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Application No.: US16496893Application Date: 2018-03-27
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Publication No.: US11462676B2Publication Date: 2022-10-04
- Inventor: Jean-Marc Bethoux , Yann Sinquin , Damien Radisson
- Applicant: Soitec
- Applicant Address: FR Bernin
- Assignee: Soitec
- Current Assignee: Soitec
- Current Assignee Address: FR Bernin
- Agency: TraskBritt
- Priority: FR1752733 20170331
- International Application: PCT/FR2018/050744 WO 20180327
- International Announcement: WO2018/178562 WO 20181004
- Main IPC: H01L41/253
- IPC: H01L41/253 ; H01L41/08 ; H01L41/319 ; H03H3/08 ; H03H9/02

Abstract:
A method for adjusting the stress state of a piezoelectric film having a first stress state at room temperature includes a step of forming an assembly including a carrier having a thermal expansion coefficient, a compliant layer placed on the carrier, and the piezoelectric film placed on the compliant layer, the piezoelectric film having a thermal expansion coefficient different from that of the carrier. The method also includes a step of heat treating the assembly, in which the assembly is heated to a treatment temperature above the glass transition temperature of the compliant layer. The present disclosure also relates to a process for fabricating an acoustic wave device comprising the piezoelectric layer the stress state of which was adjusted as described herein.
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