Invention Grant
- Patent Title: Extreme ultraviolet light generation apparatus and electronic device manufacturing method
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Application No.: US16842577Application Date: 2020-04-07
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Publication No.: US11474433B2Publication Date: 2022-10-18
- Inventor: Yuki Takeda , Yutaka Shiraishi
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/027

Abstract:
An extreme ultraviolet light generation apparatus that generates plasma by irradiating a target substance with a pulse laser beam and generates extreme ultraviolet light from the plasma includes: a chamber housing a collector mirror configured to condense the extreme ultraviolet light; a gas introduction pipe through which gas is introduced into the chamber; a mass flow controller configured to change the flow rate of the gas; a discharge pump configured to discharge the gas from the chamber; a pressure sensor configured to monitor the pressure in the chamber; and a control unit configured to control the mass flow controller based on the pressure measured by using the pressure sensor. The control unit controls the mass flow controller to increase an increase ratio of the flow rate of the gas entering the chamber as the pressure acquired by the pressure sensor increases.
Public/Granted literature
- US20200233309A1 EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD Public/Granted day:2020-07-23
Information query
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