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公开(公告)号：US12207382B2
公开(公告)日：2025-01-21
申请号：US18163023
申请日：2023-02-01
Applicant: Gigaphoton Inc.
Inventor： Nozomu Oue , Yutaka Shiraishi
Abstract: A target supply system includes a target generation unit configured to generate a liquid target substance by melting a solid target substance at an inside thereof, and output the liquid target substance; an input mechanism configured to introduce the solid target substance to the target generation unit; a heater arranged at the target generation unit; a sensor configured to detect a temperature of the target generation unit; and a processor configured to control an input timing at which the solid target substance is introduced to the target generation unit, perform feedback control on the heater based on a present temperature detected by the sensor, and perform feedforward control on the heater based on the input timing while performing feedback control on the heater.
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2.发明公开公开(公告)号：US20230284364A1
公开(公告)日：2023-09-07
申请号：US18163023
申请日：2023-02-01
Applicant: Gigaphoton Inc.
Inventor： Nozomu OUE , Yutaka Shiraishi
CPC classification number: H05G2/006 , H05G2/008 , G03F7/70033 , G03F7/70025 , G21K1/06
Abstract: A target supply system includes a target generation unit configured to generate a liquid target substance by melting a solid target substance at an inside thereof, and output the liquid target substance; an input mechanism configured to introduce the solid target substance to the target generation unit; a heater arranged at the target generation unit; a sensor configured to detect a temperature of the target generation unit; and a processor configured to control an input timing at which the solid target substance is introduced to the target generation unit, perform feedback control on the heater based on a present temperature detected by the sensor, and perform feedforward control on the heater based on the input timing while performing feedback control on the heater.
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公开(公告)号：US10955760B2
公开(公告)日：2021-03-23
申请号：US16812831
申请日：2020-03-09
Applicant: Gigaphoton Inc.
Inventor： Masaki Nakano , Yutaka Shiraishi
Abstract: An extreme ultraviolet light generation device includes: a target supply unit including a nozzle through which a target substance in a liquid form is output into a chamber; a piezoelectric element configured to vibrate the nozzle under a droplet connection condition to regularly generate a droplet of the target substance; and a control unit configured to perform search processing of changing a drive condition of the piezoelectric element to search for a drive condition of the piezoelectric element corresponding to the droplet connection condition and configured to set a drive condition of the piezoelectric element used for generation of extreme ultraviolet light based on a result of the search processing. The control unit preliminarily drives the piezoelectric element before performing the search processing and starts the search processing after performing the preliminary drive.
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公开(公告)号：US10524343B2
公开(公告)日：2019-12-31
申请号：US16429331
申请日：2019-06-03
Applicant: Gigaphoton Inc.
Inventor： Takanobu Ishihara , Toshihiro Nishisaka , Yutaka Shiraishi
Abstract: An extreme ultraviolet light generation apparatus includes: a chamber; a target supply unit that supplies a droplet of a target substance to a plasma generation region in the chamber; a first pipe at least partly covering a trajectory of the droplet and having a first opened end part as an upstream end part and a second opened end part as a downstream end part in a trajectory direction; a second pipe at least partly covering the first pipe with a gap between the second pipe and the first pipe, and having a third end part, opened and extending downstream of the second end part of the first pipe in the trajectory direction, as a downstream end part in the trajectory direction; and a gas supply unit that supplies gas flowing through the gap and causes the gas to flow in the trajectory direction out of a gas exit.
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公开(公告)号：US10349508B2
公开(公告)日：2019-07-09
申请号：US15888111
申请日：2018-02-05
Applicant: Gigaphoton Inc.
Inventor： Yutaka Shiraishi , Toshihiro Nishisaka , Toshiyuki Hirashita , Takuya Ishii
IPC: H05G2/00
Abstract: A target storage device may include a tank configured to store a target that generates extreme ultraviolet light when being irradiated with laser light, a heater connected with the tank and configured to heat the tank, and a radiation member disposed to cover at least a part of the tank connected with the heater and configured to reflect heat radiation from the tank and the heater toward the tank.
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Patent Agency Ranking
公开(公告)号：US10237961B2
公开(公告)日：2019-03-19
申请号：US16155192
申请日：2018-10-09
Applicant: Gigaphoton Inc.
Inventor： Tsukasa Hori , Yutaka Shiraishi , Shinya Ikesaka , Takanobu Ishihara , Toshiro Umeki
IPC: H05G2/00
Abstract: A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.
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7.发明授权公开(公告)号：US10028365B2
公开(公告)日：2018-07-17
申请号：US15697954
申请日：2017-09-07
Applicant: Gigaphoton Inc.
Inventor： Takanobu Ishihara , Tsukasa Hori , Takashi Saito , Yutaka Shiraishi
Abstract: A chamber device may include a chamber, and a target generation device assembled into the chamber and configured to supply a target material into the chamber, the target generation device including a tank configured to store the target material, a temperature variable device configured to vary temperature of the target material in the tank, and a nozzle section in which a nozzle hole configured to output the target material in a liquid form is formed, and the chamber device may further include a gas nozzle having an inlet port facing the nozzle section and configured to introduce gas into the chamber, a gas supply source configured to supply gas containing hydrogen to the gas nozzle to supply the gas containing the hydrogen to at least periphery of the nozzle section, and a moisture remover configured to remove moisture at least in the periphery of the nozzle section in the chamber.
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公开(公告)号：US09039957B2
公开(公告)日：2015-05-26
申请号：US13770939
申请日：2013-02-19
Applicant: Gigaphoton Inc.
Inventor： Yutaka Shiraishi , Osamu Wakabayashi
Abstract: A target material refinement device may include a refinement tank to accommodate a target material, a heating section to heat the interior of the refinement tank, and an oxygen-atom removing section to remove oxygen atoms present in the target material.
Abstract translation: 目标材料细化装置可以包括用于容纳目标材料的精制罐，用于加热精制罐内部的加热部分和氧原子去除部分以除去存在于目标材料中的氧原子。
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9.发明授权公开(公告)号：US12185449B2
公开(公告)日：2024-12-31
申请号：US17934469
申请日：2022-09-22
Applicant: Gigaphoton Inc.
Inventor： Fumio Iwamoto , Yutaka Shiraishi
Abstract: An EUV light generation apparatus to generate EUV light by irradiating a target with pulse laser light to turn the target into plasma includes a chamber, a target supply unit configured to supply the target to a plasma generation region in the chamber, a pulse laser device configured to generate pulse laser light to be radiated to the target, and a processor configured to change a generation frequency of the target generated by the target supply unit to a natural number multiple of an irradiation frequency of the pulse laser light based on a size of the target or related information related to the size of the target.
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公开(公告)号：US12150233B2
公开(公告)日：2024-11-19
申请号：US17831255
申请日：2022-06-02
Applicant: Gigaphoton Inc.
Inventor： Yutaka Shiraishi , Hideki Shishiba
IPC: H05G2/00 , G03F7/00 , H01L21/027
Abstract: A target substance replenishment device may include a first container containing a solid target substance, a first path through which the solid target substance supplied from the first container passes, a first supply switching device switching between a first state where supply of the solid target substance from the first container to the first path is suppressed and a second state where the supply of the solid target substance from the first container to the first path is allowed, a first valve connected to the first path, a second path which is connected to the first valve and through which the solid target substance having passed through the first valve passes, a first detector outputting a first detection signal indicating that the second path is clogged with the solid target substance, and a processor controlling the first supply switching device to the first state based on the first detection signal.
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