Invention Grant
- Patent Title: Metrology sensor, illumination system and method of generating measurement illumination with a configurable illumination spot diameter
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Application No.: US17415671Application Date: 2019-11-19
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Publication No.: US11474435B2Publication Date: 2022-10-18
- Inventor: Sebastianus Adrianus Goorden , Simon Reinald Huisman , Sergei Sokolov
- Applicant: ASML Netherlands B. V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B. V.
- Current Assignee: ASML Netherlands B. V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP18214547 20181220
- International Application: PCT/EP2019/081723 WO 20191119
- International Announcement: WO2020/126257 WO 20200625
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02B6/42 ; G02B21/06

Abstract:
Disclosed is an illumination system for delivering incoherent radiation to a metrology sensor system. Also disclosed is an associated metrology system and method. The illumination system comprises a spatial filter system for selective spatial filtering of a beam of said incoherent radiation outside of a module housing of the metrology sensor system. At least one optical guide is provided for guiding the spatially filtered beam of incoherent radiation to the metrology sensor system, the at least one optical guide being such that the radiation guided has a substantially similar output angle as input angle.
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