公开(公告)号：US11474435B2

公开(公告)日：2022-10-18

申请号：US17415671

申请日：2019-11-19

Applicant: ASML Netherlands B. V.

Inventor： Sebastianus Adrianus Goorden ,  Simon Reinald Huisman ,  Sergei Sokolov

IPC: G03F7/20 ,  G02B6/42 ,  G02B21/06

Abstract: Disclosed is an illumination system for delivering incoherent radiation to a metrology sensor system. Also disclosed is an associated metrology system and method. The illumination system comprises a spatial filter system for selective spatial filtering of a beam of said incoherent radiation outside of a module housing of the metrology sensor system. At least one optical guide is provided for guiding the spatially filtered beam of incoherent radiation to the metrology sensor system, the at least one optical guide being such that the radiation guided has a substantially similar output angle as input angle.

公开(公告)号：US20250053106A1

公开(公告)日：2025-02-13

申请号：US18721718

申请日：2022-12-14

Applicant: ASML Netherlands B,V.

Inventor： Sebastianus Adrianus Goorden ,  Simon Reinald Huisman

IPC: G03F9/00

Abstract: Disclosed is an apparatus for and method of using local alignment position deviation parameters for alignment marks on a semiconductor wafer wherein the parameters are used to generate one or more values indicating a condition of the alignment marks, which values may be used to obtain an wafer grid model having an improved fit.