Invention Grant
- Patent Title: Vacuum channel field effect transistor, producing method thereof, and semiconductor device
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Application No.: US17324923Application Date: 2021-05-19
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Publication No.: US11476074B2Publication Date: 2022-10-18
- Inventor: Yoshiyuki Ando
- Applicant: Yoshiyuki Ando , Rieko Ando , Yukiko Noguchi , Emiko Takahira
- Applicant Address: JP Tokyo; JP Tokyo; JP Tokyo; JP Tokyo
- Assignee: Yoshiyuki Ando,Rieko Ando,Yukiko Noguchi,Emiko Takahira
- Current Assignee: Yoshiyuki Ando,Rieko Ando,Yukiko Noguchi,Emiko Takahira
- Current Assignee Address: JP Tokyo; JP Tokyo; JP Tokyo; JP Tokyo
- Agency: Fox Rothschild LLP
- Agent Robert Sacco; Carol E. Thorstad-Forsyth
- Priority: JPJP2020152350 20200910
- Main IPC: H01J1/316
- IPC: H01J1/316 ; H01L29/786 ; H01J19/02 ; H01J1/308

Abstract:
A vacuum channel field effect transistor includes a first insulator on a p-type semiconductor substrate, a gate electrode on the first insulator, a second insulator on the gate electrode, a drain electrode on the second insulator, and an n+ impurity diffusion layer in the surface of the p-type semiconductor substrate, the n+ impurity diffusion layer being in contact with a side wall including side faces of the first insulator, the gate electrode, and the second insulator. Application of predetermined voltages to the n+ impurity diffusion layer, the gate electrode, and the drain electrode causes charge carriers in the n+ impurity diffusion layer to travel through a vacuum or air faced by the side wall to the drain electrode, which can increase the source-drain current.
Public/Granted literature
- US20210375571A1 VACUUM CHANNEL FIELD EFFECT TRANSISTOR, PRODUCING METHOD THEREOF, AND SEMICONDUCTOR DEVICE Public/Granted day:2021-12-02
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