Invention Grant
- Patent Title: Memory device having 2-transistor vertical memory cell and shared channel region
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Application No.: US17003019Application Date: 2020-08-26
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Publication No.: US11476252B2Publication Date: 2022-10-18
- Inventor: Karthik Sarpatwari , Kamal M. Karda , Durai Vishak Nirmal Ramaswamy , Haitao Liu
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Schwegman Lundberg & Woessner, P.A.
- Main IPC: H01L27/108
- IPC: H01L27/108 ; G11C11/401

Abstract:
Some embodiments include apparatuses and methods of forming the apparatuses. One of the apparatuses includes a first data line located in a first level of the apparatus; a second data line located in a second level of the apparatus; a first memory cell located in a third level of the apparatus between the first and second levels, the first memory cell including a first transistor coupled to the first data line, and a second transistor coupled between the first data line and a charge storage structure of the first transistor; and a second memory cell located in a fourth level of the apparatus between the first and second levels, the second memory cell including a third transistor coupled to the second data line, and a fourth transistor coupled between the second data line and a charge storage structure of the third transistor, the first transistor coupled in series with the third transistor between the first and second data lines.
Public/Granted literature
- US20210066300A1 MEMORY DEVICE HAVING 2-TRANSISTOR VERTICAL MEMORY CELL AND SHARED CHANNEL REGION Public/Granted day:2021-03-04
Information query
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