Invention Grant
- Patent Title: Electrolytic capacitor and process for forming an electrolytic capacitor
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Application No.: US16992714Application Date: 2020-08-13
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Publication No.: US11482382B2Publication Date: 2022-10-25
- Inventor: Yaru Shi , Antony P. Chacko , Chenyi Gu , Ajaykumar Bunha , Qingping Chen
- Applicant: KEMET Electronics Corporation
- Applicant Address: US FL Fort Lauderdale
- Assignee: KEMET Electronics Corporation
- Current Assignee: KEMET Electronics Corporation
- Current Assignee Address: US FL Fort Lauderdale
- Agency: Patent Filing Specialist Inc.
- Agent Joseph T. Guy
- Main IPC: H01G9/00
- IPC: H01G9/00 ; H01G9/028 ; H01G9/15 ; H01B1/12 ; H01G9/042

Abstract:
The invention is related to an improved capacitor and an improved process for forming a capacitor. The process comprises forming an anode comprising a dielectric on the anode. A cathode layer is then formed on the dielectric wherein the cathode layer comprises a self-doped conductive polymer and a cross-linker wherein a weight ratio of crosslinker to self-doped conductive polymer is at least 0.01 to no more than 2.
Public/Granted literature
- US20200373089A1 Capacitors with Improved Capacitance Public/Granted day:2020-11-26
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