Invention Grant
- Patent Title: Semiconductor device electrodes including fluorine
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Application No.: US16916751Application Date: 2020-06-30
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Publication No.: US11488958B2Publication Date: 2022-11-01
- Inventor: Chang Mu An , Sang Yeol Kang , Young-Lim Park , Jong-Bom Seo , Se Hyoung Ahn
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Myers Bigel, P.A.
- Priority: KR10-2019-0135044 20191029
- Main IPC: H01L25/065
- IPC: H01L25/065 ; H01L25/00 ; H01L21/768 ; H01L23/00 ; H01L23/31 ; H01L27/108

Abstract:
A semiconductor device includes a landing pad on a substrate, a lower electrode on the landing pad, the lower electrode being electrically connected to the landing pad, a dielectric layer on the lower electrode, the dielectric layer extending along a profile of the lower electrode, an upper electrode on the dielectric layer, and an upper plate electrode on the upper electrode and including first fluorine (F) therein, wherein the upper plate electrode includes an interface facing the upper electrode, and wherein the upper plate electrode includes a portion in which a concentration of the first fluorine decreases as a distance from the interface of the upper plate electrode increases.
Public/Granted literature
- US20210125993A1 SEMICONDUCTOR DEVICES AND METHODS FOR FABRICATING THE SAME Public/Granted day:2021-04-29
Information query
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