Invention Grant
- Patent Title: Method of manufacturing light emitting element
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Application No.: US16908354Application Date: 2020-06-22
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Publication No.: US11489086B2Publication Date: 2022-11-01
- Inventor: Naoto Inoue , Minoru Yamamoto , Satoshi Okumura , Hiroki Okamoto , Hiroaki Tamemoto
- Applicant: NICHIA CORPORATION
- Applicant Address: JP Anan
- Assignee: NICHIA CORPORATION
- Current Assignee: NICHIA CORPORATION
- Current Assignee Address: JP Anan
- Agency: Global IP Counselors, LLP
- Priority: JPJP2019-123139 20190701
- Main IPC: H01L33/00
- IPC: H01L33/00

Abstract:
A method of manufacturing light emitting elements includes: providing a wafer including a substrate formed of sapphire and having a first main surface and a second main surface, and a semiconductor layered body disposed on the first main surface of the substrate; irradiating a laser beam into the substrate to form a modified region inside the substrate, the modified region having a crack reaching the first main surface and a crack reaching the second main surface; irradiating CO2 laser to a region of the substrate overlapping with a region to which the laser beam has been irradiated; and cleaving the wafer along the modified region to obtain the light emitting elements each having a hexagonal shape in a plan view.
Public/Granted literature
- US20210005777A1 METHOD OF MANUFACTURING LIGHT EMITTING ELEMENT Public/Granted day:2021-01-07
Information query
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