Invention Grant
- Patent Title: Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material
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Application No.: US17254111Application Date: 2019-06-21
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Publication No.: US11492703B2Publication Date: 2022-11-08
- Inventor: Katja Väyrynen , Timo Hatanpää , Anton Vihervaara , Mikko Ritala , Markku Leskelä
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP Holding B.V.
- Current Assignee: ASM IP Holding B.V.
- Current Assignee Address: NL Almere
- Agency: Snell & Wilmer L.L.P.
- International Application: PCT/IB2019/000805 WO 20190621
- International Announcement: WO2020/002995 WO 20200102
- Main IPC: C23C16/18
- IPC: C23C16/18 ; C23C16/455 ; C23C16/08 ; H01L39/12 ; H01L43/10
Abstract:
A method of depositing a metal-containing material is disclosed. The method can include use of cyclic deposition techniques, such as cyclic chemical vapor deposition and atomic layer deposition. The metal-containing material can include intermetallic compounds. A structure including the metal-containing material and a system tor forming the material are also disclosed.
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