An integrated device that includes a substrate, a first transistor, and a second transistor. The second transistor is configured to be coupled to the first transistor. The first transistor is configured to operate as a N-type channel metal oxide semiconductor transistor (NMOS) transistor. The first transistor includes a dielectric layer disposed over the substrate; a first source disposed over the dielectric layer; a first drain disposed over the dielectric layer; a first plurality of channels coupled to the first source and the first drain; and a first gate surrounding the plurality of channels. The second transistor is configured to operate as a P-type channel metal oxide semiconductor transistor (PMOS). The second transistor includes the dielectric layer; a second source disposed over the dielectric layer; a second drain disposed over the dielectric layer; a second plurality of channels coupled to the second source and the second drain; and a second gate.