- Patent Title: Process for the generation of metal- or semimetal-containing films
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Application No.: US17259666Application Date: 2019-07-04
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Publication No.: US11505865B2Publication Date: 2022-11-22
- Inventor: David Dominique Schweinfurth , Lukas Mayr , Sinja Verena Klenk , David Scheschkewitz , Kinga Izabela Leszczynska
- Applicant: BASF SE
- Applicant Address: DE Ludwigshafen am Rhein
- Assignee: BASF SE
- Current Assignee: BASF SE
- Current Assignee Address: DE Ludwigshafen am Rhein
- Agency: Faegre Drinker Biddle & Reath LLP
- Priority: EP18183135 20180712
- International Application: PCT/EP2019/067973 WO 20190704
- International Announcement: WO2020/011637 WO 20200116
- Main IPC: C23C16/18
- IPC: C23C16/18 ; C23C16/32 ; C23C16/34 ; C23C16/36 ; C23C16/455

Abstract:
The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. It relates to a process for preparing metal- or semimetal-containing films comprising (a) depositing a metal- or semimetal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate with the deposited metal- or semimetal-containing compound in contact with compound of general formula (II), (III), or (IV), wherein E is Ge or Sn, R is an alkyl group, an alkenyl group, an aryl group, or a silyl group, R′ are an alkyl group, an alkenyl group, an aryl group, or a silyl group, X is nothing, hydrogen, a halide, an alkyl group, an alkylene group, an aryl group, an alkoxy group, an aryl oxy group, an amino group, or a amidinate group, or an guanidinate group, L is an alkyl group, an alkenyl group, an aryl group, or a silyl group.
Public/Granted literature
- US20210324516A1 PROCESS FOR THE GENERATION OF METAL- OR SEMIMETAL-CONTAINING FILMS Public/Granted day:2021-10-21
Information query
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