Invention Grant
- Patent Title: Replacement method for droplet generator
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Application No.: US17338441Application Date: 2021-06-03
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Publication No.: US11528798B2Publication Date: 2022-12-13
- Inventor: Shih-Yu Tu , Han-Lung Chang , Hsiao-Lun Chang , Li-Jui Chen , Po-Chung Cheng
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Maschoff Brennan
- Main IPC: H05G2/00
- IPC: H05G2/00

Abstract:
A method includes ejecting a metal droplet from a reservoir of a first droplet generator assembled to a vessel; emitting an excitation laser from a laser source to the metal droplet to generate extreme ultraviolet (EUV) radiation; turning off the first droplet generator; cooling down the first droplet generator to a temperature not lower than about 150° C.; dismantling the first droplet generator from the vessel at the temperature not lower than about 150° C.; and assembling a second droplet generator to the vessel.
Public/Granted literature
- US20210298161A1 REPLACEMENT METHOD FOR DROPLET GENERATOR Public/Granted day:2021-09-23
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