Invention Grant
- Patent Title: Method for measuring gas temperature in plasma
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Application No.: US17001132Application Date: 2020-08-24
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Publication No.: US11530955B2Publication Date: 2022-12-20
- Inventor: Daoman Han , Yongxin Liu , Fei Gao , Zigeng Liu , Zhenguo Jing , Younian Wang
- Applicant: Dalian University of Technology
- Applicant Address: CN Dalian
- Assignee: Dalian University of Technology
- Current Assignee: Dalian University of Technology
- Current Assignee Address: CN Dalian
- Agency: Fish & Richardson P.C.
- Priority: CN201910838772.5 20190905
- Main IPC: G01K11/32
- IPC: G01K11/32 ; G01J3/28 ; G01K1/14

Abstract:
The present invention discloses a device for measuring gas temperature in plasma, including: a vacuum chamber, a fiber optic temperature sensor, a quartz tube, a circulator, a spectrometer, a broadband light source and a computer. One end of the quartz tube is inserted into the vacuum chamber. The fiber optic temperature sensor is located in the plasma in the vacuum chamber and fixed to the quartz tube. The fiber optic temperature sensor is connected to the circulator by means of an optical fiber passing through the quartz tube. The circulator is connected to the broadband light source and the spectrometer through optical fibers, respectively. The spectrometer is electrically connected to the computer which is configured to read and record spectra collected by the spectrometer.
Public/Granted literature
- US20210072096A1 METHOD FOR MEASURING GAS TEMPERATURE IN PLASMA Public/Granted day:2021-03-11
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