- Patent Title: Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets
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Application No.: US17135527Application Date: 2020-12-28
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Publication No.: US11531274B2Publication Date: 2022-12-20
- Inventor: Mariya Vyacheslavivna Medvedyeva , Maria Isabel De La Fuente Valentin , Martijn Jongen , Giulio Bottegal , Thomai Zacharopoulou
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: EP19219619 20191224
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A recipe selection method includes obtaining measurements from metrology targets, metrology targets positioned on a semiconductor substrate, obtaining measurements from in-device targets, in-device targets positioned on the semiconductor substrate, and determining a recipe for accurate metrology using both metrology target measurements and in-device metrology measurements.
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