公开(公告)号：US20210191280A1

公开(公告)日：2021-06-24

申请号：US17135527

申请日：2020-12-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Mariya Vyacheslavivna Medvedyeva ,  Maria Isabel De La Fuente Valentin ,  Martijn Jongen ,  Giulio Bottegal ,  Thomai Zacharopoulou

IPC: G03F7/20

Abstract: A recipe selection method includes obtaining measurements from metrology targets, metrology targets positioned on a semiconductor substrate, obtaining measurements from in-device targets, in-device targets positioned on the semiconductor substrate, and determining a recipe for accurate metrology using both metrology target measurements and in-device metrology measurements.

公开(公告)号：US11531274B2

公开(公告)日：2022-12-20

申请号：US17135527

申请日：2020-12-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Mariya Vyacheslavivna Medvedyeva ,  Maria Isabel De La Fuente Valentin ,  Martijn Jongen ,  Giulio Bottegal ,  Thomai Zacharopoulou

IPC: G03F7/20

Abstract: A recipe selection method includes obtaining measurements from metrology targets, metrology targets positioned on a semiconductor substrate, obtaining measurements from in-device targets, in-device targets positioned on the semiconductor substrate, and determining a recipe for accurate metrology using both metrology target measurements and in-device metrology measurements.