Invention Grant
- Patent Title: Manufacturing method of anodic oxide film structure and anodic oxide film structure
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Application No.: US17128758Application Date: 2020-12-21
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Publication No.: US11535001B2Publication Date: 2022-12-27
- Inventor: Bum Mo Ahn , Seung Ho Park , Sung Hyun Byun
- Applicant: POINT ENGINEERING CO., LTD.
- Applicant Address: KR Asan
- Assignee: POINT ENGINEERING CO., LTD.
- Current Assignee: POINT ENGINEERING CO., LTD.
- Current Assignee Address: KR Asan
- Priority: KR10-2020-0007568 20200120
- Main IPC: B32B43/00
- IPC: B32B43/00 ; B23P6/00 ; B32B3/26 ; B32B7/12 ; B32B15/20 ; C25D11/04 ; B32B37/12 ; B32B15/04
Abstract:
Proposed are a manufacturing method of an anodic oxide film structure, and an anodic oxide film structure. More particularly, proposed are a manufacturing method of an anodic oxide film structure, and an anodic oxide film structure, wherein production yield of the entire product can be improved by repairing a defective region to be made normal.
Public/Granted literature
- US20210221091A1 MANUFACTURING METHOD OF ANODIC OXIDE FILM STRUCTURE AND ANODIC OXIDE FILM STRUCTURE Public/Granted day:2021-07-22
Information query
