- 专利标题: Lithographic apparatus and device manufacturing method
-
申请号: US17119331申请日: 2020-12-11
-
公开(公告)号: US11537038B2公开(公告)日: 2022-12-27
- 发明人: Nicolaas Rudolf Kemper , Sjoerd Nicolaas Lambertus Donders , Joost Jeroen Ottens , Edwin Cornelis Kadijk , Sergei Shulepov
- 申请人: ASML NETHERLANDS B.V.
- 申请人地址: NL Veldhoven
- 专利权人: ASML NETHERLANDS B.V.
- 当前专利权人: ASML NETHERLANDS B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman, LLP
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; G03B27/42
摘要:
Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.
公开/授权文献
- US20210173294A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 公开/授权日:2021-06-10
信息查询
IPC分类: