公开(公告)号：US11537038B2

公开(公告)日：2022-12-27

申请号：US17119331

申请日：2020-12-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf Kemper ,  Sjoerd Nicolaas Lambertus Donders ,  Joost Jeroen Ottens ,  Edwin Cornelis Kadijk ,  Sergei Shulepov

IPC: G03F7/20 ,  G03B27/42

Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.

公开(公告)号：US12117721B2

公开(公告)日：2024-10-15

申请号：US18087320

申请日：2022-12-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf Kemper ,  Sjoerd Nicolaas Lambertus Donders ,  Joost Jeroen Ottens ,  Edwin Cornelis Kadijk ,  Sergei Shulepov

IPC: G03F7/20 ,  G03B27/42 ,  G03F7/00

CPC classification number: G03B27/42 ,  G03F7/70341 ,  G03F7/70716

Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.

公开(公告)号：US12051607B2

公开(公告)日：2024-07-30

申请号：US17257900

申请日：2019-06-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Patriek Adrianus Alphonsus Maria Bruurs ,  Dennis Herman Caspar Van Banning ,  Jan-Gerard Cornelis Van Der Toorn ,  Edwin Cornelis Kadijk

IPC: H01L21/67 ,  G01K1/14 ,  G01K11/125 ,  H01J37/20 ,  H01J37/244 ,  H01L21/68

CPC classification number: H01L21/67248 ,  G01K1/14 ,  G01K11/125 ,  H01J37/20 ,  H01J37/244 ,  H01L21/68 ,  H01J2237/20228 ,  H01J2237/20235

Abstract: A stage apparatus including: an object table configured to hold an object; a positioning device configured to position the object table and the object held by the object table; and a remote temperature sensor configured to measure a temperature of the object table and/or the object, wherein the remote temperature sensor comprises a passive temperature sensing element.

公开(公告)号：US11942340B2

公开(公告)日：2024-03-26

申请号：US17811047

申请日：2022-07-06

Applicant: ASML Netherlands B.V.

Inventor： Jeroen Gerard Gosen ,  Te-Yu Chen ,  Dennis Herman Caspar Van Banning ,  Edwin Cornelis Kadijk ,  Martijn Petrus Christianus Van Heumen ,  Erheng Wang ,  Johannes Andreas Henricus Maria Jacobs

IPC: H01L21/67 ,  G03F7/00

CPC classification number: H01L21/67201 ,  G03F7/70841 ,  G03F7/70858 ,  H01L21/67098

Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.

公开(公告)号：US11430678B2

公开(公告)日：2022-08-30

申请号：US16514843

申请日：2019-07-17

Applicant: ASML Netherlands B.V.

Inventor： Jeroen Gerard Gosen ,  Te-Yu Chen ,  Dennis Herman Caspar Van Banning ,  Edwin Cornelis Kadijk ,  Martijn Petrus Christianus Van Heumen ,  Erheng Wang ,  Johannes Andreas Henricus Maria Jacobs

IPC: H01L21/67 ,  G03F7/20

Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.

公开(公告)号：US11158484B2

公开(公告)日：2021-10-26

申请号：US16805633

申请日：2020-02-28

Applicant: ASML Netherlands B.V.

Inventor： Dennis Herman Caspar Van Banning ,  Jeroen Gerard Gosen ,  Maarten Lambertus Henricus Ter Heerdt ,  Edwin Cornelis Kadijk

IPC: H01J37/20

Abstract: An e-beam inspection tool is disclosed, the tool comprising, an electron optics system configured to generate an electron beam, an object table configured to hold a specimen, a positioning device configured to position the object table, the positioning device comprising an actuator, wherein the positioning device further comprises a heating device configured to generate a heat load and a heat load controller to control the generated heat load at least partly based on an actuator heat load generated in the actuator.

公开(公告)号：US10268128B2

公开(公告)日：2019-04-23

申请号：US15742168

申请日：2016-06-14

Applicant: ASML Netherlands B.V.

Inventor： Franciscus Johannes Joseph Janssen ,  Johannes Paul Marie De La Rosette ,  Edwin Cornelis Kadijk ,  Nicolas Alban Lallemant ,  Jan Liefooghe ,  Markus Rolf Werner Matthes ,  Marcel Johannus Elisabeth Hubertus Muitjens ,  Hubert Matthieu Richard Steijns ,  André Gillis Van De Velde ,  Marinus Aart Van Den Brink

IPC: G03F7/20 ,  H01S3/036 ,  H01S3/04 ,  H01S3/041 ,  H01S3/23 ,  H05G2/00 ,  F28C1/08 ,  H01S3/038 ,  H01S3/223

Abstract: A lithographic apparatus comprising an illumination system configured to condition a radiation beam, a support structure constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto the substrate, the lithographic apparatus being provided with a first cooling fluid circuit which is configured to cool components to a first temperature, and provided with a second cooling fluid circuit which is configured to cool components to a second temperature that is lower than the first temperature.