Invention Grant
- Patent Title: System and method for aligning a mask with a substrate
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Application No.: US16848645Application Date: 2020-04-14
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Publication No.: US11538706B2Publication Date: 2022-12-27
- Inventor: Alexander N. Lerner , Michael P. Karazim , Andrew J. Constant , Jeffrey A. Brodine , Kim Ramkumar Vellore , Kevin Moraes , Roey Shaviv
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan, LLP
- Main IPC: H01L21/68
- IPC: H01L21/68 ; H01J37/32 ; H01L21/673 ; H01L21/677 ; C23C16/04

Abstract:
An alignment module for positioning a mask on a substrate comprises a mask stocker, an alignment stage, and a transfer robot. The mask stocker houses a mask cassette that stores a plurality of masks. The alignment stage is configured to support a carrier and a substrate. The transfer robot is configured to transfer one of the one or more masks from the mask stocker to the alignment stage and position the mask over the substrate. The alignment module may be part of an integrated platform having one or more transfer chambers, a factory interface having a substrate carrier chamber and one or more processing chambers. A carrier may be coupled to a substrate within the substrate carrier chamber and moved between the processing chambers to generate a semiconductor device.
Public/Granted literature
- US20200373183A1 SYSTEM AND METHOD FOR ALIGNING A MASK WITH A SUBSTRATE Public/Granted day:2020-11-26
Information query
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