Invention Grant
- Patent Title: Nanoparticle formation mitigation in a deposition process
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Application No.: US16919569Application Date: 2020-07-02
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Publication No.: US11542593B2Publication Date: 2023-01-03
- Inventor: James W. Neal , Brian T. Hazel , David A. Litton , Eric Jorzik
- Applicant: Raytheon Technologies Corporation
- Applicant Address: US CT Farmington
- Assignee: Raytheon Technologies Corporation
- Current Assignee: Raytheon Technologies Corporation
- Current Assignee Address: US CT Farmington
- Agency: Bachman & LaPointe, P.C.
- Main IPC: C23C14/30
- IPC: C23C14/30 ; C23C14/56 ; C23C14/54
Abstract:
A system for depositing coating on a workpiece includes a deposition chamber within which is formed a vortex to at least partially surround a workpiece therein.
Public/Granted literature
- US20200332409A1 NANOPARTICLE FORMATION MITIGATION IN A DEPOSITION PROCESS Public/Granted day:2020-10-22
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