- 专利标题: Systems and methods for enclosed electroplating chambers
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申请号: US17065621申请日: 2020-10-08
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公开(公告)号: US11542626B2公开(公告)日: 2023-01-03
- 发明人: James Piascik , Glenn Sklar , Joseph W. Mintzer, III
- 申请人: Honeywell International Inc.
- 申请人地址: US NJ Morris Plains
- 专利权人: Honeywell International Inc.
- 当前专利权人: Honeywell International Inc.
- 当前专利权人地址: US NJ Morris Plains
- 代理机构: Bookoff McAndrews PLLC
- 主分类号: C25D17/10
- IPC分类号: C25D17/10 ; C25D21/04 ; C25D21/08 ; C25D21/12 ; C25D17/00
摘要:
Systems and methods for automated electroplating are disclosed. An electroplating system includes a first chamber configured to receive one or more parts. The first chamber includes a vessel extending from a first end to a second end, a first cap proximate to the first end a first cathode contact coupled to the first end, a second cathode contact coupled to the second end, and a plurality of anodes formed on an inner surface of the vessel. The electroplating system further includes at least one reservoir and a first conduit and a second conduit each coupled between the at least one reservoir and the first chamber. The first conduit may be configured to transfer fluid from the first reservoir to the first chamber and the second conduit may be configured to transfer fluid from the first chamber to the at least one reservoir.
公开/授权文献
- US20220112621A1 SYSTEMS AND METHODS FOR ENCLOSED ELECTROPLATING CHAMBERS 公开/授权日:2022-04-14
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