Invention Grant
- Patent Title: Substrate comprising interconnects embedded in a solder resist layer
-
Application No.: US17066318Application Date: 2020-10-08
-
Publication No.: US11545425B2Publication Date: 2023-01-03
- Inventor: Kun Fang , Jaehyun Yeon , Suhyung Hwang , Hong Bok We
- Applicant: QUALCOMM Incorporated
- Applicant Address: US CA San Diego
- Assignee: QUALCOMM Incorporated
- Current Assignee: QUALCOMM Incorporated
- Current Assignee Address: US CA San Diego
- Agency: Loza & Loza, LLP
- Main IPC: H01L23/498
- IPC: H01L23/498 ; H01L23/00 ; H01L21/48

Abstract:
A substrate that includes a core layer, at least one first dielectric layer located over a first surface of the core layer, at least one second dielectric layer located over a second surface of the core layer, a plurality of first interconnects located over a surface of the at least one first dielectric layer, a plurality of second interconnects located over the surface of the at least one first dielectric layer, a plurality of third interconnects located over the surface of the at least one first dielectric layer, and a solder resist layer located over the surface of the at least one second dielectric layer. The plurality of third interconnects and the plurality of second interconnects are co-planar to the plurality of first interconnects. The solder resist layer includes a first portion, a second portion, and a third portion.
Public/Granted literature
- US20220115312A1 SUBSTRATE COMPRISING INTERCONNECTS EMBEDDED IN A SOLDER RESIST LAYER Public/Granted day:2022-04-14
Information query
IPC分类: