Invention Grant
- Patent Title: Member for plasma processing apparatus and plasma processing apparatus with the same
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Application No.: US16830205Application Date: 2020-03-25
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Publication No.: US11548827B2Publication Date: 2023-01-10
- Inventor: Takashi Ikeda , Hajime Ishii , Kenji Fujimoto , Naoyuki Satoh , Nobuyuki Nagayama , Koichi Murakami , Takahiro Murakami
- Applicant: NIPPON TUNGSTEN CO., LTD. , TOKYO ELECTRON LIMITED
- Applicant Address: JP Fukuoka; JP Tokyo
- Assignee: NIPPON TUNGSTEN CO., LTD.,TOKYO ELECTRON LIMITED
- Current Assignee: NIPPON TUNGSTEN CO., LTD.,TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Fukuoka; JP Tokyo
- Agency: Squire Patton Boggs (US) LLP
- Priority: JPJP2019-072006 20190404
- Main IPC: C04B35/56
- IPC: C04B35/56 ; C23F4/00 ; H01L21/67 ; H01J37/32
Abstract:
Provided is a member for a plasma processing apparatus consisting of a tungsten carbide phase. The member includes at least one type of atom selected from the group consisting of a Fe atom, a Co atom, and a Ni atom, in which the total content of the atoms is in a range of 30 to 3300 atomic ppm.
Public/Granted literature
Information query
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