- Patent Title: Alkali-free borosilicate glasses with low post-HF etch roughness
-
Application No.: US16272305Application Date: 2019-02-11
-
Publication No.: US11554984B2Publication Date: 2023-01-17
- Inventor: Timothy Michael Gross , Yuhui Jin , Ruchirej Yongsunthon , Liying Zhang
- Applicant: Corning Incorporated
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Agent Amy T. Lang
- Main IPC: C03C3/097
- IPC: C03C3/097 ; C03C15/00 ; C03C23/00 ; C03C15/02 ; C03C3/093 ; C03C3/087
Abstract:
An article comprises a glass substrate. The glass substrate has a first surface having a plurality of vias therein, and a second surface parallel to the first surface. At least one of the first surface and the second surface is an etched surface having a surface roughness (Ra) of 0.75 nm or less. The glass substrate comprises, in mol percent on an oxide basis: 65 mol %≤SiO2≤75 mol %; 7 mol %≤Al2O3≤15 mol %; 26.25 mol %≤RO+Al2O3−B2O3; 0 mol %≤R2O≤2 mol %. RO=MgO+CaO+SrO+BaO+ZnO. R2O=Li2O+Na2O+K2O+Rb2O+Cs2O.
Public/Granted literature
- US20190256404A1 ALKALI-FREE BOROSILICATE GLASSES WITH LOW POST-HF ETCH ROUGHNESS Public/Granted day:2019-08-22
Information query
