Invention Grant
- Patent Title: Substrate support, lithographic apparatus and loading method
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Application No.: US16092021Application Date: 2017-03-21
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Publication No.: US11556063B2Publication Date: 2023-01-17
- Inventor: Johannes Onvlee , Antonius Franciscus Johannes De Groot , Wim Symens , David Ferdinand Vles
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP16166176 20160420
- International Application: PCT/EP2017/056644 WO 20170321
- International Announcement: WO2017/182216 WO 20171026
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A substrate support for supporting a substrate. The substrate support comprises a main body, a clamping device and a dither device. The main body comprises a support surface for supporting the substrate. The clamping device is arranged to provide the clamping force to clamp the substrate on the support surface. The dither device is configured to dither the clamping force. The dither device may be configured to dither the clamping force while the substrate W is being loaded onto the support surface.
Public/Granted literature
- US20190113853A1 SUBSTRATE SUPPORT, LITHOGRAPHIC APPARATUS AND LOADING METHOD Public/Granted day:2019-04-18
Information query
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