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公开(公告)号：US11003095B2
公开(公告)日：2021-05-11
申请号：US16332002
申请日：2017-08-31
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Krijn Frederik Bustraan , Yang-Shan Huang , Antonius Franciscus Johannes De Groot , Minkyu Kim , Jasper Anne Frido Marikus Simons , Theo Anjes Maria Ruijl , Ronald Josephus Maria Lamers
IPC: G03F7/20
Abstract: A positioning system for positioning an object. The positioning system includes a stage, a balance mass and an actuator system. The stage is for holding the object. The actuator system is arranged to drive the stage in a first direction while driving the balance mass in a second direction opposite to the first direction. The stage is moveable in the first direction in a movement range. When the stage is moving in the first direction and is at an end of the movement range, the positioning system is arranged to collide the stage frontally into the balance mass.
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2.发明申请SUBSTRATE TABLE SYSTEM, LITHOGRAPHIC APPARATUS AND SUBSTRATE TABLE SWAPPING METHOD 有权基板表系统，平面设备和基板表交换方法公开(公告)号：US20150153661A1
公开(公告)日：2015-06-04
申请号：US14388773
申请日：2013-02-15
Applicant: ASML Netherlands B.V.
Inventor： Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Antonius Franciscus Johannes De Groot , Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Hans Butler
CPC classification number: G03F7/70758 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F9/70 , H02K41/02
Abstract: A substrate table system includes a substrate table and a dual directional motor for moving the substrate table in a plane of movement that is defined by a first direction and a second direction. The dual directional motor includes: a first pusher structure extending in the first direction, the substrate table being movable in respect of the first pusher structure, the first pusher structure and the substrate table being arranged to cooperate to form a first motor to exert a force between the first pusher structure and the substrate table in the first direction; and a second pusher structure extending in the first direction, the substrate table being movable in respect of the second pusher structure, the second pusher structure and the substrate table to cooperate to form a second motor to exert a force between the second pusher structure and the substrate table in the second direction.
Abstract translation: 衬底台系统包括衬底台和用于在由第一方向和第二方向限定的运动平面中移动衬底台的双向电动机。 双向电动机包括：沿第一方向延伸的第一推动器结构，所述衬底台相对于第一推动器结构可移动，第一推动器结构和衬底台布置成协作以形成第一电动机以施加力 在所述第一推动器结构和所述基板台之间沿所述第一方向; 以及沿所述第一方向延伸的第二推动器结构，所述衬底台可相对于所述第二推动器结构，所述第二推动器结构和所述衬底台移动以协作以形成第二电动机，以在所述第二推动器结构和所述第二推动器结构之间施加力 衬底台在第二个方向。
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公开(公告)号：US12032301B2
公开(公告)日：2024-07-09
申请号：US18090873
申请日：2022-12-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Onvlee , Antonius Franciscus Johannes De Groot , Wim Symens , David Ferdinand Vles
IPC: G03F7/00
CPC classification number: G03F7/70708 , G03F7/70691 , G03F7/707 , G03F7/70733
Abstract: A substrate support for supporting a substrate. The substrate support includes a main body, a clamping device and a dither device. The main body includes a support surface for supporting the substrate. The clamping device is arranged to provide the clamping force to clamp the substrate on the support surface. The dither device is configured to dither the clamping force. The dither device may be configured to dither the clamping force while the substrate is being loaded onto the support surface.
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公开(公告)号：US10747125B2
公开(公告)日：2020-08-18
申请号：US16177585
申请日：2018-11-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Adrianus Hendrik Koevoets , Sjoerd Nicolaas Lambertus Donders , Menno Fien , Antonius Franciscus Johannes De Groot , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Martijn Houben , Jan Steven Christiaan Westerlaken , Jim Vincent Overkamp , Maarten Van Beijnum
IPC: G03F7/20
Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.
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公开(公告)号：US09726985B2
公开(公告)日：2017-08-08
申请号：US14376210
申请日：2013-01-25
Inventor： Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Antonius Franciscus Johannes De Groot , Johannes Petrus Martinus Bernardus Vermeulen , Theodorus Petrus Maria Cadee , Robertus Mathijs Gerardus Rijs , Richard Henricus Adrianus Van Lieshout
CPC classification number: G03F7/70716 , G03F7/70758 , G03F7/709 , H02K41/02
Abstract: A movable stage system is configured to support an object subjected to a lithography process. A short stroke part (SS) is configured to support the object (W) and a long stroke part (LS) is configured to support the short stroke part. The short stroke part is movable over a relative small range of movement with respect to the long stroke part. The long stroke part is movable over a relative large range of movement with respect to a base support arranged to support the long stroke part. A shielding element (SE) is arranged between the short and long stroke parts. A position control system (PCS) maintains a substantially constant distance between the shielding element and the short stroke part.
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Patent Agency Ranking
公开(公告)号：US20140375975A1
公开(公告)日：2014-12-25
申请号：US14376210
申请日：2013-01-25
Inventor： Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Antonius Franciscus Johannes De Groot , Johannes Petrus Martinus Bernardus Vermeulen , Theodorus Petrus Maria Cadee , Robertus Mathijs Gerardus Rijs , Richard Henricus Adrianus Van Lieshout
CPC classification number: G03F7/70716 , G03F7/70758 , G03F7/709 , H02K41/02
Abstract: A movable stage system is configured to support an object subjected to a lithography process. A short stroke part (SS) is configured to support the object (W) and a long stroke part (LS) is configured to support the short stroke part. The short stroke part is movable over a relative small range of movement with respect to the long stroke part. The long stroke part is movable over a relative large range of movement with respect to a base support arranged to support the long stroke part. A shielding element (SE) is arranged between the short and long stroke parts. A position control system (PCS) maintains a substantially constant distance between the shielding element and the short stroke part.
Abstract translation: 可移动台系统被配置为支撑经受光刻处理的物体。 短行程部件（SS）被配置为支撑物体（W），并且长行程部件（LS）被配置为支撑短行程部件。 短行程部分可以相对于长行程部分在相对较小的移动范围内移动。 长行程部件可相对于布置成支撑长行程部件的基座支撑件在相对较大的运动范围内移动。 屏蔽元件（SE）设置在短行程部件和长行程部件之间。 位置控制系统（PCS）在屏蔽元件和短行程部件之间保持基本恒定的距离。
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公开(公告)号：US11231646B2
公开(公告)日：2022-01-25
申请号：US16614815
申请日：2018-06-08
Applicant: ASML NETHERLANDS B.V.
Inventor： David Ferdinand Vles , Chaitanya Krishna Ande , Antonius Franciscus Johannes De Groot , Adrianus Johannes Maria Giesbers , Johannes Joseph Janssen , Paul Janssen , Johan Hendrik Klootwijk , Peter Simon Antonius Knapen , Evgenia Kurganova , Marcel Peter Meijer , Wouter Rogier Meijerink , Maxim Aleksandrovich Nasalevich , Arnoud Willem Notenboom , Raymond Olsman , Hrishikesh Patel , Mária Péter , Gerrit Van Den Bosch , Wilhelmus Theodorus Anthonius Johannes Van Den Einden , Willem Joan Van Der Zande , Pieter-Jan Van Zwol , Johannes Petrus Martinus Bernardus Vermeulen , Willem-Pieter Voorthuijzen , Hendrikus Jan Wondergem , Aleksandar Nikolov Zdravkov
IPC: G03F1/64
Abstract: A pellicle assembly is disclosed that has a pellicle frame defining a surface onto which a pellicle is to be attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. There is also disclosed a pellicle assembly for a patterning device, the pellicle assembly including one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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公开(公告)号：US10228626B2
公开(公告)日：2019-03-12
申请号：US15736297
申请日：2016-04-28
Applicant: ASML Netherlands B.V.
Inventor： Antonius Franciscus Johannes De Groot , Theo Anjes Maria Ruijl , Christiaan Louis Valentin , Christian Werner
IPC: G03F7/20 , G03B27/58 , H01L21/027 , H01L21/68
Abstract: A movable support configured to support an object, the support including: a support plane to support the object, an actuator assembly to move the movable support in a first direction and in a second direction perpendicular to the first direction, wherein the first direction and the second direction extend in a plane parallel to the support plane, wherein the actuator assembly includes: a first actuator configured to exert a first actuation force in a first actuation direction, the first actuation direction being parallel to the support plane, a second actuator configured to exert a second actuation force in a second actuation direction, the second actuation direction being parallel to the support plane, wherein the first actuation direction and the second actuation direction are arranged non-parallel and non-perpendicular with respect to each other.
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公开(公告)号：US10120292B2
公开(公告)日：2018-11-06
申请号：US15297001
申请日：2016-10-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Adrianus Hendrik Koevoets , Sjoerd Nicolaas Lambertus Donders , Menno Fien , Antonius Franciscus Johannes De Groot , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Martijn Houben , Jan Steven Christiaan Westerlaken , Jim Vincent Overkamp , Maarten Van Beijnum
Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.
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公开(公告)号：US10001713B2
公开(公告)日：2018-06-19
申请号：US14762452
申请日：2014-02-05
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Santiago E. Del Puerto , Matthew Lipson , Kenneth C. Henderson , Raymond Wilhelmus Louis LaFarre , Louis John Markoya , Tammo Uitterdijk , Johannes Petrus Martinus Bernardus Vermeulen , Antonius Franciscus Johannes De Groot , Ronald Van Der Wilk
IPC: G03B27/52 , G03F7/20 , H01L21/67 , H01L21/683 , H01L21/687
CPC classification number: G03F7/70875 , G03F7/70708 , H01L21/67109 , H01L21/6831 , H01L21/6875
Abstract: A support such as a clamp (310) is configured to releasably hold a patterning device such as a reticle (300) to secure it and prevent heat-induced deformation of it. For example, an electrostatic clamp includes a first substrate (312) having opposing first (313) and second (315) surfaces, a plurality of burls (316) located on the first surface and configured to contact the reticle, a second substrate (314) having opposing first (317) and second (319) surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements (318) are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.
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