Invention Grant
- Patent Title: Shadow mask with plasma resistant coating
-
Application No.: US16096665Application Date: 2016-05-24
-
Publication No.: US11566322B2Publication Date: 2023-01-31
- Inventor: Xi Huang , Fei Peng , Kiran Krishnapur , Ruiping Wang , Jrjyan Jerry Chen , Steven Verhaverbeke , Robert Jan Visser
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- International Application: PCT/CN2016/083114 WO 20160524
- International Announcement: WO2017/201669 WO 20171130
- Main IPC: C23C16/04
- IPC: C23C16/04 ; C23C16/44 ; H01L51/52 ; H01L51/56
Abstract:
A mask assembly (100) includes a mask frame (102) and a mask screen (104), both of the mask frame (102) and the mask screen (104) made of a metallic material, and a metal coating (125) disposed on exposed surfaces of one or both of the mask frame (102) and the mask screen (104).
Public/Granted literature
- US20210222291A1 SHADOW MASK WITH PLASMA RESISTANT COATING Public/Granted day:2021-07-22
Information query
IPC分类:
