- 专利标题： Coating composition for use with an overcoated photoresist
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申请号： US16653659申请日： 2019-10-15
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公开(公告)号： US11567408B2公开(公告)日： 2023-01-31
- 发明人: Hye-Won Lee , Min Kyung Jang , Soo Jung Leem , Jae Hwan Sim , Emad Aqad
- 申请人： ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. , ROHM AND HAAS ELECTRONIC MATERIALS LLC
- 申请人地址： KR Cheonan-si; US MA Marlborough
- 专利权人： ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.,ROHM AND HAAS ELECTRONIC MATERIALS LLC
- 当前专利权人： ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.,ROHM AND HAAS ELECTRONIC MATERIALS LLC
- 当前专利权人地址： KR Cheonan-si; US MA Marlborough
- 代理机构： Cantor Colburn LLP
- 主分类号： G03F7/11
- IPC分类号： G03F7/11 ; C08F220/34 ; C09D133/14 ; G03F7/09 ; C09D179/02 ; C09D5/00 ; C08F226/06 ; C09D139/08 ; C08G73/02
摘要：
A method for forming a photoresist relief image including applying a layer of a coating composition on a substrate; and disposing a layer of a photoresist composition on the layer of the coating composition, wherein the coating composition comprises an amine-containing polymer comprising a hydrocarbon-substituted amino group and having nitrogen atoms in an amount from 3 to 47 weight percent, based on a total weight of the amine-containing polymer.
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