- 专利标题: Non-planar silicided semiconductor electrical fuse
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申请号: US17104078申请日: 2020-11-25
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公开(公告)号: US11574867B2公开(公告)日: 2023-02-07
- 发明人: Ephrem G. Gebreselasie , Vibhor Jain , Yves T. Ngu , Johnatan A. Kantarovsky , Alain F. Loiseau
- 申请人: GLOBALFOUNDRIES U.S. Inc.
- 申请人地址: US CA Santa Clara
- 专利权人: GLOBALFOUNDRIES U.S. Inc.
- 当前专利权人: GLOBALFOUNDRIES U.S. Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Hoffman Warnick LLC
- 代理商 Francois Pagette
- 主分类号: H01L23/52
- IPC分类号: H01L23/52 ; H01L23/525 ; H01L21/8249 ; H01L21/02 ; H01L27/07 ; H01L23/62 ; H01L27/115 ; H01L27/112 ; H01L27/02
摘要:
An electrical fuse (e-fuse) includes a fuse link including a silicided semiconductor layer over a dielectric layer covering a gate conductor. The silicided semiconductor layer is non-planar and extends orthogonally over the gate conductor. A first terminal is electrically coupled to a first end of the fuse link, and a second terminal is electrically coupled to a second end of the fuse link. The fuse link may be formed in the same layer as an intrinsic and/or extrinsic base of a bipolar transistor. The gate conductor may control a current source for programming the e-fuse. The e-fuse reduces the footprint and the required programming energy compared to conventional e-fuses.
公开/授权文献
- US20220165663A1 NON-PLANAR SILICIDED SEMICONDUCTOR ELECTRICAL FUSE 公开/授权日:2022-05-26
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