Invention Grant
- Patent Title: Capacitive sensor for chamber condition monitoring
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Application No.: US16812066Application Date: 2020-03-06
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Publication No.: US11581206B2Publication Date: 2023-02-14
- Inventor: Yaoling Pan , Patrick John Tae , Leonard Tedeschi , Jennifer Sun , Philip Allan Kraus , Xiaopu Li , Kallol Bera , Michael D. Willwerth , Albert Barrett Hicks, III , Lisa J. Enman , Mark Joseph Saly , Daniel Thomas McCormick
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt, P.C.
- Main IPC: H01L21/67
- IPC: H01L21/67 ; G01N27/22 ; G05B19/418
Abstract:
Embodiments disclosed herein comprise a sensor. In an embodiment, the sensor comprises a substrate having a first surface and a second surface opposite from the first surface. In an embodiment, the sensor further comprises a first electrode over the first surface of the substrate, and a second electrode over the first surface of the substrate and adjacent to the first electrode. In an embodiment, the sensor further comprises a barrier layer over the first electrode and the second electrode.
Public/Granted literature
- US20210280443A1 CAPACITIVE SENSOR FOR CHAMBER CONDITION MONITORING Public/Granted day:2021-09-09
Information query
IPC分类:
